The Types segment classifies soda‑lime glass photomasks into three principal sub‑categories: single‑layer, multi‑layer, and phase‑shift masks. Single‑layer masks, representing the most cost‑effective solution, are employed where pattern complexity is modest, typically in legacy process nodes and certain display applications; they contribute the largest share of type‑based revenue due to their broad adoption and lower manufacturing overhead. Multi‑layer masks incorporate stacked glass substrates with distinct pattern layers, enabling finer resolution and tighter critical dimension control for advanced semiconductor nodes; despite higher production costs, they capture a growing portion of the market as manufacturers transition to sub‑20 nm technologies. Phase‑shift masks, which modulate the phase of transmitted light to enhance image contrast, occupy a niche yet strategically important role, especially in high‑volume logic production where yield improvements justify the premium price. Together, these sub‑types define the structural taxonomy of the market, each aligning with specific performance requirements and influencing the overall market size.