Segmentation by types of Positive Photoresist Remover distinguishes four chemical families, each with internal sub‑categories that affect adoption rates. Solvent‑based removers (e.g., N‑methyl‑2‑pyrrolidone, dimethyl sulfoxide) are prized for aggressive stripping but split into aromatic and aliphatic variants, influencing toxicity and waste‑treatment costs. Aqueous removers rely on surfactant‑enhanced water systems, with subtypes such as alkaline‑based, chelating‑agent‑augmented, and enzymatic blends that cater to low‑environmental‑impact mandates. Polymer‑based removers employ high‑molecular‑weight polymers to encapsulate resist residues; they are further classified into thermoplastic and cross‑linked networks, each offering differing re‑coat compatibility. Hybrid formulations combine solvent and aqueous elements, yielding mixed‑mode subtypes like solvent‑in‑water emulsions and micro‑encapsulated solvent droplets, which balance stripping power with substrate safety. The relative market share of each type is governed by process‑specific performance criteria, regulatory pressures, and total cost of ownership, collectively defining the market taxonomy.