The type dimension of Gas Laser Cleaning Equipment segmentation distinguishes among CO₂, CO, Excimer, and Helium‑Neon laser systems. CO₂ lasers dominate the market, accounting for roughly 55 % of total revenue, because their high power output and longer wavelength (10.6 µm) enable efficient removal of oxides and contaminants from metallic surfaces without thermal distortion. CO lasers, representing about 25 % of the market, are valued for their shorter wavelength (5.3 µm) that offers finer control in delicate cleaning tasks such as semiconductor wafer preparation. Excimer lasers, contributing near 15 %, operate in the ultraviolet spectrum, delivering precise ablation for thin‑film and polymeric substrates where minimal heat input is critical. Helium‑Neon lasers, a niche segment at roughly 5 %, are employed in micro‑scale cleaning where low power and high beam quality are required. Collectively, these technology families shape the overall market size by aligning laser physics with process requirements across diverse industrial contexts.