The market taxonomy for Chemically Amplified Photoresists distinguishes three core Types: positive‑tone, negative‑tone, and dual‑tone formulations, each further divided into sub‑categories based on polymer backbone, acid generator (PAG) chemistry, and performance modifiers. Positive‑tone resists, which become soluble upon exposure, dominate the high‑resolution node market due to superior resolution and low line‑edge roughness; they are sub‑segmented into chemically amplified positive resists with either organic or inorganic PAGs. Negative‑tone resists, insoluble after exposure, are favored for thick‑film and high‑aspect‑ratio applications, with sub‑types such as chemically amplified negative resists incorporating cross‑linking agents. Dual‑tone resists combine both behaviors, enabling complex patterning strategies in multi‑layer processes. The distribution among these types aligns with application needs: positive‑tone occupies the largest share, while negative‑tone and dual‑tone collectively support niche but growing segments, reinforcing the overall market composition.